Entry Date:
November 14, 2006

Axiomatic Design of CMP Machine

Principal Investigator Jung-Hoon Chun

Co-investigator Nannaji Saka


Axiomatic design is investigated as a design methodology for large or complex system design. Particular considerations of system design are described and the suitability of axiomatic design for such considerations is discussed. Then, tools to enable successful application of axiomatic design to systems are developed. A design of a machine tool system for polishing silicon wafers using chemical mechanical polishing (CMP) is presented. The CMP system architecture is decomposed from top level requirements using the principles of axiomatic design, and the theorems developed. The CMP system was designed and fabricated by this research group, and has demonstrated excellent capability to remove material from the surface of a wafer while maintained an increased control of the removal.